Influence of Annealing Temperature on the Crystallization Kinetics of Fe82Si8B10 Amorphous Ribbon

Authors

  • A Said Sikder Department of Physics, Khulna University of Engineering & Technology, Khulna-9203, Bangladesh
  • SD Nath Department of Physics, Khulna University of Engineering & Technology, Khulna-9203, Bangladesh
  • SS Sikder Department of Physics, Khulna University of Engineering & Technology, Khulna-9203, Bangladesh

DOI:

https://doi.org/10.3329/jes.v11i1.49553

Keywords:

Activation energy; Amorphous Ribbon; Annealing; Crystallization kinetics; DTA.

Abstract

Amorphous soft magnetic materials have significant potential applications in specialist power transformers and in inductive devices. With the composition of Fe82Si8B10, 82% of the transition metals Fe and about 18% of metalloid or glass-former elements like B and Si are strongly magnetic at room temperature and offer dynamic opportunities for engineering applications. The crystallization kinetics has been studied by differential thermal analysis (DTA). The sample was annealed in a controlled way in the temperature range of 350-450°C at constant annealing time one hour. The kinetics of primary crystallization α-Fe(Si) phase and secondary crystallization Fe2B phase was studied as affected due to temperature. The sample annealed at 350oC temperature is almost unchanged which is still lower than that of primary crystallization temperature but the same condition when sample annealed at 450°C completely shows that the primary crystallization α-Fe(Si) phase has vanished and crystallization event took place to a good extent.

Journal of Engineering Science 11(1), 2020, 107-112

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Published

2020-10-05

How to Cite

Sikder, A. S., Nath, S., & Sikder, S. (2020). Influence of Annealing Temperature on the Crystallization Kinetics of Fe82Si8B10 Amorphous Ribbon. Journal of Engineering Science, 11(1), 107–112. https://doi.org/10.3329/jes.v11i1.49553

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